郝泽宇:Frequency dependence of plasma characteristics at different pressures in cylindrical inductively coupled plasma source论文

郝泽宇:Frequency dependence of plasma characteristics at different pressures in cylindrical inductively coupled plasma source论文

本文主要研究内容

作者郝泽宇,宋健,滑跃,张改玲,白晓东,任春生(2019)在《Frequency dependence of plasma characteristics at different pressures in cylindrical inductively coupled plasma source》一文中研究指出:The effects of driving frequency on plasma parameters and electron heating efficiency are studied in cylindrical inductively coupled plasma(ICP) source. Measurements are made in an Ar discharge for driving frequency at 13.56/2 MHz, and pressures of 0.4-1.2 Pa. In 13.56 MHz discharge, higher electron density(n_e) and higher electron temperature(T_e) are observed in comparison with 2 MHz discharge at 0.6-1.2 Pa. However, slightly higher n_e and T_e are observed in 2 MHz discharge at 0.4 Pa. This observation is explained by enhanced electron heating efficiency due to the resonance between the oscillation of 2 MHz electromagnetic field and electron-neutral collision process at 0.4 Pa. It is also found that the variation of T_edistribution is different in 13.56 and 2 MHz discharge.For ICP at 13.56 MHz, T_eshows an edge-high profile at 0.4-1.2 Pa. For 2 MHz discharge, T_e remains an edge-high distribution at 0.4-0.8 Pa. However, the distribution pattern involves into a center-high profile at 0.9-1.2 Pa. The spatial profiles of n_e remain a center-high shape in both 13.56 and 2 MHz discharges, which indicates the nonlocal kinetics at low pressures. Better uniformity could be achieved by using 2 MHz discharge. The effects of gas pressure on plasma parameters are also examined. An increase in gas pressure necessitates the rise of n_e in both 13.56 and 2 MHz discharges. Meanwhile, T_e drops when gas pressure increases and shows a flatter distribution at higher pressure.

Abstract

The effects of driving frequency on plasma parameters and electron heating efficiency are studied in cylindrical inductively coupled plasma(ICP) source. Measurements are made in an Ar discharge for driving frequency at 13.56/2 MHz, and pressures of 0.4-1.2 Pa. In 13.56 MHz discharge, higher electron density(n_e) and higher electron temperature(T_e) are observed in comparison with 2 MHz discharge at 0.6-1.2 Pa. However, slightly higher n_e and T_e are observed in 2 MHz discharge at 0.4 Pa. This observation is explained by enhanced electron heating efficiency due to the resonance between the oscillation of 2 MHz electromagnetic field and electron-neutral collision process at 0.4 Pa. It is also found that the variation of T_edistribution is different in 13.56 and 2 MHz discharge.For ICP at 13.56 MHz, T_eshows an edge-high profile at 0.4-1.2 Pa. For 2 MHz discharge, T_e remains an edge-high distribution at 0.4-0.8 Pa. However, the distribution pattern involves into a center-high profile at 0.9-1.2 Pa. The spatial profiles of n_e remain a center-high shape in both 13.56 and 2 MHz discharges, which indicates the nonlocal kinetics at low pressures. Better uniformity could be achieved by using 2 MHz discharge. The effects of gas pressure on plasma parameters are also examined. An increase in gas pressure necessitates the rise of n_e in both 13.56 and 2 MHz discharges. Meanwhile, T_e drops when gas pressure increases and shows a flatter distribution at higher pressure.

论文参考文献

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  • 论文详细介绍

    论文作者分别是来自Plasma Science and Technology的郝泽宇,宋健,滑跃,张改玲,白晓东,任春生,发表于刊物Plasma Science and Technology2019年07期论文,是一篇关于,Plasma Science and Technology2019年07期论文的文章。本文可供学术参考使用,各位学者可以免费参考阅读下载,文章观点不代表本站观点,资料来自Plasma Science and Technology2019年07期论文网站,若本站收录的文献无意侵犯了您的著作版权,请联系我们删除。

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