论文摘要
ZnSe属直接带隙Ⅱ-Ⅵ族的半导体晶体,具有红外波段透射率高、禁带宽度大等诸多优良的光学特性,在红外窗口材料、叠层多结太阳能电池和电致发光器件等方面有着广泛的应用。目前ZnSe薄膜材料的应用要远远广泛于其他形式的ZnSe材料。拥有着广阔的发展前景,在光电器件方面备受关注。本文采用电化学沉积方法从ZnSO4和SeO2的电解溶液中在ITO导电玻璃基底上生长制备出ZnSe薄膜,并研究了电沉积工艺参数,包括n(Zn2+)/n(SeO32-)浓度比、电流密度、温度、PH值对ZnSe薄膜晶体生长的影响。采用EDS, XRD, SEM,和红外透过仪测试并分析了薄膜的性表与光学特性。
论文目录
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